Prototype of photoresist thin film coating (thin film prototyping and development support)
A method of micro-particle layering (spray coating method) has been proposed that enables the application of thin films of photoresist to devices with difficult-to-coat uneven surfaces.
We are conducting prototype coating of photoresist thin films on MEMS devices with uneven and three-dimensional shapes. We offer prototype formation of photoresist thin films from a few pieces to large lots. If you are facing issues with the resist coating method for uneven and three-dimensional shapes, please feel free to consult us. We are engaged in daily development support activities as your "Rental Prototype Division." We collaborate with organizations such as the National Institute of Advanced Industrial Science and Technology (AIST), Yokohama National University, and Shinshu University to provide prototype support to research institutions and private companies. Additionally, we have numerous achievements in providing equipment proposals and consulting services to the MEMS manufacturing industry. Currently, we are active at the Shonan Fujisawa Research Institute. *Please contact us through the inquiry page on our website below for any questions or consultations.*
- Company：エーシングテクノロジーズ 湘南藤沢研究所
- Price：Other
